الرئيسية › دليل الباحثين › A. Mosser

A. Mosser

الانتماء : Institut de Physique et Chimie des Matériaux de Strasbourg

• 17منشورات (انتماء فرنسي)
• 77مجموع المنشورات
• 1085الاستشهادات
• 20مؤشر h

ORCIDOpenAlex

مجالات البحث

• Electron and X-Ray Spectroscopy Techniques
• Metal and Thin Film Mechanics
• Semiconductor materials and interfaces
• Copper Interconnects and Reliability
• Advanced Electron Microscopy Techniques and Applications

المنشورات (17)

• Effect of oxygen partial pressure on the structural and optical properties of dc sputtered ITO thin films
  2009 · Journal of Alloys and Compounds · استُشهد به 83 مرة
• Surface morphology and reaction at Cu/Si interface—Effect of native silicon suboxide
  2006 · Applied Surface Science · استُشهد به 17 مرة
• Optical and electrical properties of sputtered ZrN compounds
  2004 · Catalysis Today · استُشهد به 20 مرة
• Non-stoichiometric niobium nitrides: structure and properties
  2003 · Thin Solid Films · استُشهد به 28 مرة
• On the existence of superstructure in TiNx thin films
  2003 · Thin Solid Films · استُشهد به 27 مرة
• Optical properties of non-stoichiometric sputtered zirconium nitride films
  2003 · Applied Surface Science · استُشهد به 26 مرة
• Investigations on non-stoichiometric zirconium nitrides
  2002 · Applied Surface Science · استُشهد به 83 مرة
• Nitrogen plasma pressure influence on the composition of TiN x O y sputtered films
  2002 · Surface and Interface Analysis · استُشهد به 49 مرة
• Theoretical and experimental investigations on elastic properties of substoichiometric titanium nitrides: influence of lattice vacancies
  2001 · International Journal of Inorganic Materials · استُشهد به 31 مرة
• Silicidation in chromium–amorphous silicon multilayer films
  2001 · Thin Solid Films · استُشهد به 5 مرة
• Effect of implanted phosphorus on silicide formation in the Cr/Si(111) system
  2001 · Thin Solid Films · استُشهد به 2 مرة
• Antimony dopant redistribution during copper silicide formation
  2001 · International Journal of Inorganic Materials · استُشهد به 2 مرة
• Electronic changes induced by vacancies on spectral and elastic properties of titanium carbides and nitrides
  2000 · Journal of Electron Spectroscopy and Related Phenomena · استُشهد به 60 مرة
• Behaviour of copper atoms in annealed Cu/SiOx/Si systems
  2000 · Applied Surface Science · استُشهد به 46 مرة
• Etching effect on the texture and the stress of copper layers evaporated on Si(100)
  2000 · Materials Science and Engineering A · استُشهد به 6 مرة
• Cross-sectional TEM investigations of the influence of P+ ions implanted in the Si substrate on the atomic interdiffusion in the Cr–Si system
  2000 · Materials Science and Engineering B · استُشهد به 5 مرة
• Electrical properties of Cr/Si(p) structures
  1999 · Solid-State Electronics · استُشهد به 7 مرة

مجلات النشر

• Applied Surface Science × 4
• Thin Solid Films × 4
• International Journal of Inorganic Materials × 2
• Journal of Alloys and Compounds × 1
• Catalysis Today × 1
• Surface and Interface Analysis × 1

المنشورات حسب السنة

• 20091
• 20061
• 20041
• 20033
• 20022
• 20014
• 20004
• 19991

التعاون العلمي

المؤسسات الشريكة : Centre National de la Recherche Scientifique · Université de Bourgogne

المؤلفون المشاركون

• J.C. Parlebas
• G. Schmerber
• Jaques Faerber
• B. Domenichini
• J.P Sens
• Olivier Heintz
• G. Ehret
• D. Raiser
• S. Bourgeois
• L. Imhoff
• J. Werckman

البيانات البيبليوغرافية مصدرها OpenAlex (قاعدة مفتوحة).