A. Mosser

Affiliation : Institut de Physique et Chimie des Matériaux de Strasbourg

17Publications (affiliation in France)
77Total publications
1085Citations
20h-index

Research profile

A. Mosser has 17 indexed publications (1999–2009). Their work appears mainly in “Applied Surface Science”, “Thin Solid Films” and “International Journal of Inorganic Materials”. Their most cited article, “Effect of oxygen partial pressure on the structural and optical properties of dc sputtered ITO thin films” (2009), has been cited 83 times. Their work is co-authored with at least 11 researchers.

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Research areas

Electron and X-Ray Spectroscopy Techniques
Metal and Thin Film Mechanics
Semiconductor materials and interfaces
Copper Interconnects and Reliability
Advanced Electron Microscopy Techniques and Applications

Publications (17)

Effect of oxygen partial pressure on the structural and optical properties of dc sputtered ITO thin films
2009 · Journal of Alloys and Compounds · cited 83 times
Surface morphology and reaction at Cu/Si interface—Effect of native silicon suboxide
2006 · Applied Surface Science · cited 17 times
Optical and electrical properties of sputtered ZrN compounds
2004 · Catalysis Today · cited 20 times
Non-stoichiometric niobium nitrides: structure and properties
2003 · Thin Solid Films · cited 28 times
On the existence of superstructure in TiNx thin films
2003 · Thin Solid Films · cited 27 times
Optical properties of non-stoichiometric sputtered zirconium nitride films
2003 · Applied Surface Science · cited 26 times
Investigations on non-stoichiometric zirconium nitrides
2002 · Applied Surface Science · cited 83 times
Nitrogen plasma pressure influence on the composition of TiN x O y sputtered films
2002 · Surface and Interface Analysis · cited 49 times
Theoretical and experimental investigations on elastic properties of substoichiometric titanium nitrides: influence of lattice vacancies
2001 · International Journal of Inorganic Materials · cited 31 times
Silicidation in chromium–amorphous silicon multilayer films
2001 · Thin Solid Films · cited 5 times
Effect of implanted phosphorus on silicide formation in the Cr/Si(111) system
2001 · Thin Solid Films · cited 2 times
Antimony dopant redistribution during copper silicide formation
2001 · International Journal of Inorganic Materials · cited 2 times
Electronic changes induced by vacancies on spectral and elastic properties of titanium carbides and nitrides
2000 · Journal of Electron Spectroscopy and Related Phenomena · cited 60 times
Behaviour of copper atoms in annealed Cu/SiOx/Si systems
2000 · Applied Surface Science · cited 46 times
Etching effect on the texture and the stress of copper layers evaporated on Si(100)
2000 · Materials Science and Engineering A · cited 6 times
Cross-sectional TEM investigations of the influence of P+ ions implanted in the Si substrate on the atomic interdiffusion in the Cr–Si system
2000 · Materials Science and Engineering B · cited 5 times
Electrical properties of Cr/Si(p) structures
1999 · Solid-State Electronics · cited 7 times

Publication venues

Applied Surface Science × 4
Thin Solid Films × 4
International Journal of Inorganic Materials × 2
Journal of Alloys and Compounds × 1
Catalysis Today × 1
Surface and Interface Analysis × 1

Publications per year

20091
20061
20041
20033
20022
20014
20004
19991

Collaborations

Partner institutions : Centre National de la Recherche Scientifique · Université de Bourgogne

Co-authors

Bibliographic data from OpenAlex (open database).