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Home › Researcher directory › Thomas Neisius

Thomas Neisius

Affiliation : Aix-Marseille Université · Fédération des Sciences Chimiques de Marseille

  • 4Publications (affiliation in France)
  • 116Total publications
  • 2249Citations
  • 26h-index

Research profile

Thomas Neisius has 4 indexed publications (2009–2018). Their work appears mainly in “Journal of Applied Crystallography”, “The Journal of Physical Chemistry C” and “Journal of Applied Physics”. Their most cited article, “Kinetics and Energetics of Ge Condensation in SiGe Oxidation” (2015), has been cited 40 times. Their work is co-authored with at least 12 researchers, including institutions in Morocco, Tunisia.

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Research areas

  • X-ray Spectroscopy and Fluorescence Analysis
  • Photonic Crystal and Fiber Optics
  • Glass properties and applications
  • Magnetic properties of thin films
  • Advanced X-ray Imaging Techniques

Publications (4)

Publication venues

  • Journal of Applied Crystallography × 1
  • The Journal of Physical Chemistry C × 1
  • Journal of Applied Physics × 1
  • Applied Physics Letters × 1

Publications per year

  • 20181
  • 20151
  • 20121
  • 20091

Collaborations

Partner institutions : Centre National de la Recherche Scientifique · Institut des Matériaux, de Microélectronique et des Nanosciences de Provence · Centre National pour la Recherche Scientifique et Technique (CNRST) · Centre de Recherche sur l'Hétéro-Epitaxie et ses Applications · Université Nice Sophia Antipolis

Co-authors’ countries : Morocco · Tunisia

Co-authors

Bibliographic data from OpenAlex (open database).

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