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E. Scheid

Affiliation : Centre National de la Recherche Scientifique · Laboratoire d'Analyse et d'Architecture des Systèmes · Université de Toulouse

  • 7Publications (affiliation in France)
  • 189Total publications
  • 1800Citations
  • 23h-index

Research profile

E. Scheid has 7 indexed publications (1997–2011). Their work appears mainly in “International Conference on Electrical and Electronics Engineering”, “Materials Science in Semiconductor Processing” and “Spectroscopy Letters”. Their most cited article, “Boron Diffusion and Activation during Heat Treatment in Heavily Doped Polysilicon Thin Films for P+ Metal-Oxide-Semiconductor Transistors Ga” (2001), has been cited 24 times. 3 of these publications date from the last three years of activity. Their work is co-authored with at least 5 researchers, including institutions in Japan.

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Research areas

  • Semiconductor materials and devices
  • Semiconductor materials and interfaces
  • Silicon and Solar Cell Technologies
  • Copper Interconnects and Reliability
  • Advanced Materials and Semiconductor Technologies

Publications (7)

Publication venues

  • International Conference on Electrical and Electronics Engineering × 1
  • Materials Science in Semiconductor Processing × 1
  • Spectroscopy Letters × 1
  • Microelectronics Journal × 1
  • Solid State Communications × 1
  • Japanese Journal of Applied Physics × 1

Publications per year

  • 20111
  • 20101
  • 20091
  • 20081
  • 20031
  • 20011
  • 19971

Collaborations

Partner institutions : Laboratory for Integrated Micro-Mechatronic Systems · The University of Tokyo · Université Toulouse III - Paul Sabatier

Co-authors’ countries : Japan

Co-authors

Bibliographic data from OpenAlex (open database).

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