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R. Chabane

Affiliation : University Frères Mentouri Constantine 1 · University Mohamed Boudiaf of M'sila

• 3Publications (affiliation in Algeria)
• 4Total publications
• 5Citations
• 2h-index

OpenAlex

Research profile

R. Chabane has 3 indexed publications (2009–2025). Their work appears mainly in “The European Physical Journal B”, “Advanced materials research” and “Materials science forum”. Their most cited article, “CF4 doping effects on SiOF thin films: chemical, structural and dielectric properties in PECVD-deposited films from HMDSO/O2 vapor mixtures” (2025), has been cited 2 times. Their work is co-authored with at least 1 researcher.

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Research areas

• Semiconductor materials and devices
• Plasma Diagnostics and Applications
• Plasma Applications and Diagnostics
• Copper Interconnects and Reliability

Publications (3)

• CF4 doping effects on SiOF thin films: chemical, structural and dielectric properties in PECVD-deposited films from HMDSO/O2 vapor mixtures
  2025 · The European Physical Journal B · cited 2 times
• OES Diagnostics of HMDSO/O2/CF4 Microwave Plasma for SiOCxFy Films Deposition
  2011 · Advanced materials research · cited 2 times
• Characterization of SiOF Thin Films Deposited by PECVD from Hexamethyldisiloxane in Mixture with Oxygen and CF4
  2009 · Materials science forum · cited 1 times

Publication venues

• The European Physical Journal B × 1
• Advanced materials research × 1
• Materials science forum × 1

Publications per year

• 20251
• 20111
• 20091

Co-authors

• Salah Sahli

Bibliographic data from OpenAlex (open database).