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Jonathan Boucher

Affiliation : Centre National de la Recherche Scientifique · Laboratoire d'Analyse et d'Architecture des Systèmes · Université de Toulouse

1Publications (affiliation in France)
4Total publications
46Citations
3h-index

OpenAlex

Research profile

Jonathan Boucher has 1 indexed publication (2011). Their work appears in “Japanese Journal of Applied Physics”. Their most cited article, “Study of Nitrogen Effect on the Boron Diffusion during Heat Treatment in Polycrystalline Silicon/Nitrogen-Doped Silicon Thin Films” (2011), has been cited 7 times. Their work is co-authored with at least 3 researchers.

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Research areas

Semiconductor materials and devices
Semiconductor materials and interfaces
Silicon and Solar Cell Technologies
Silicon Carbide Semiconductor Technologies
Advancements in Semiconductor Devices and Circuit Design

Publications (1)

Study of Nitrogen Effect on the Boron Diffusion during Heat Treatment in Polycrystalline Silicon/Nitrogen-Doped Silicon Thin Films
2011 · Japanese Journal of Applied Physics · cited 7 times

Collaborations

Partner institutions : Université Toulouse III - Paul Sabatier · Institut National des Sciences Appliquées de Toulouse · Institut National des Sciences Appliquées de Lyon

Co-authors

Bibliographic data from OpenAlex (open database).